What is the full form of ALD?
Answer:
- Automatic Layer Deposition
What does ALD mean?
ALD is a vapor phase technique for depositing thin films onto a substrate. ALD involves exposing the surface of a substrate to alternating precursors that do not overlap but are introduced sequentially. The precursor molecule reacts with the surface in a self-limiting manner in each alternate pulse, ensuring that the reaction stops once all of the reactive sites on the substrate have been used.